The global high-k and CVD ALD metal precursors market size was valued at USD 482.1 million in 2020 and is expected to expand at a compound annual growth rate (CAGR) of 6.2% from 2021 to 2028. The growth of the market can be attributed to the low thermal stability of metal-organic composites. Extensive R&D activities by key companies are expected to improve copper metallization processes, are anticipated to accelerate the demand for deposition of first-row metal films (conducting) and dielectric (insulating) precursors onto microelectronic devices. In 2020, the COVID-19 pandemic negatively impacted several industries across the world, including the high-k and ALD/CVD metal precursors market. Therefore, responding to the COVID-19 pandemic remained the major challenge for most semiconductor industry players in 2020.
Most of the manufacturing plants across the world were closed or shut down due to the COVID-19-induced lockdowns. The semiconductor industry witnessed a decline during the first half of 2020 due to the lockdowns and associated supply chain disruptions. Although the factories reopened in the second half of the year, the high-k and ALD/CVD metal precursors market took time to normalize to the pre-COVID-19 level and is projected to rebound at a slower pace. This posed a major challenge for the most industry players.
However, the rising need for rapidly accessing and storing data has prompted the demand for materials with higher dielectric values. The Atomic Layer Deposition (ALD) of noble metals, such as ruthenium, rhodium, iridium, palladium, and platinum, is anticipated to be an active research area. The high demand for several thin-film materials for new industrial applications can be attributed to the rapid development of ALD technology. All these factors are expected to drive the market growth over the forecast period.
The selection and designing of appropriate metal-organic precursors are crucial for successfully developing new Chemical Vapor Deposition (CVD) processes. Buyers prefer insulators with high dielectric constants as they play several critical roles in modern semiconductor devices, including decreasing power consumption in Metal-Insulator-Semiconductor (MIS) field-effect transistors. The demand for metal precursors, such as aluminum, hafnium, cobalt, titanium, tantalum, tungsten, and zirconium, with a higher dielectric constant, is expected to increase over the forecast period.
Such precursors are used for manufacturing thin metallic films. There have been considerable developments in the field of ALD owing to its application in non-semiconductor areas and the rapid growth of the semiconductor industry. Atomic layer deposition is a cutting-edge deposition method that allows ultra-thin films of a few nanometers to be deposited in a specifically controlled manner. Moreover, ALD offers remarkable deposition conformality in high-aspect-ratio structures, in addition to offering thickness control at the Angstrom level.
The selection of the right precursor is a major challenge in obtaining the desired high-k material for next-generation scaled memory and Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) devices. Such semiconductor devices require conformal thin films with a high aspect ratio and low deposition temperatures. High-temperature deposition techniques may result in complexities such as reduced adhesion of non-uniform layers, interlayer atomic diffusion, changes in morphology, and changes in crystallinity.
Based on technology, the high-k and CVD ALD metal precursors market is segmented into interconnect, capacitors, and gates. High-k precursors are mostly used for manufacturing gates and capacitors while metal precursors are used for producing electrodes and interconnects. The interconnect segment accounted for largest market share in 2020 and was valued at USD 232.5 million. Interconnect is a fabrication technique that uses Copper (Cu) or Aluminum (Al) for patterning metals and introducing barrier metal layers to protect the Silicon (Si) from potential damage in an Integrated Circuit (IC). High-k dielectric layers are increasingly prevalent in certain electronic components and devices, such as advanced Metal-Insulator-Metal (MIM) capacitors, DRAMs, organic thin-film transistors, OLEDs, and non-volatile types of memory devices. The high-k metal gate technology is used for transistor scaling.
The gate segment is expected to register the highest CAGR of 10.4 % from 2021 to 2028. Significant research has been done on the ALD technique to produce thin films using high-k dielectric materials such as Al2O3, Ta2O5, HfO2, and ZrO2 for DRAMs, high-k gate oxides, and nitrides for electrodes and interconnects.
The combination of high-k dielectric and metal gate technologies offers a substantial reduction in gate leakage when transistor size is downscaled to a thickness of 1.0 nm or below. Semiconductor companies incorporate High-k Metal Gate (HKMG) stacks in MOSFETs used in the CMOS technology to continue device scaling for up to 45 nm and below nodes. The major technology introduced by Intel includes enhanced channel strain, hafnium-based and high-k gate electric and dual work-function metal replacement gate.
The Asia Pacific regional market accounted for the largest market share in 2020 and was valued at USD 309.4 million. The region is expected to continue to dominate over the forecast period owing to factors such as above-average demand for electronic products in China and continued outsourcing of electronic equipment production to China. The growing demand for semiconductor devices in Brazil, Russia, India, and China (BRIC) economies, owing to the rising need for end-use electronic products with low cost, high portability, and variety, is also expected to significantly boost the regional market growth.
The key trend favoring the market growth in the U.S. is the increasing R&D activities in nanotechnologies used in the semiconductor industry. Furthermore, the escalating demand for fabricating semiconductor devices, such as 3D-stacked ICs, having multifaceted architecture and produced using cost-effective and seamless manufacturing processes, such as ALD, is expected to drive the market growth in the country.
The prominent companies in this market include Air Liquide; Air Products & Chemicals, Inc.; Praxair; Merck KGaA; and Dow Chemical. Most of these companies are using acquisition and partnership strategies to expand their footprint in the global market. For instance, in November 2015, Merck KGaA acquired Sigma-Aldrich to invest in the life science business and strengthen its portfolio of sterility testing products. After the acquisition, SAFC Hitech business was combined with Merck’s Performance Materials business and was expected to function as a part of its Integrated Circuits business unit. Beneq, an ALD equipment and thin-film coating services provider, formed a strategic partnership agreement with The Centre for Process Innovation (CPI) to use the ALD technique in printed electronics applications. Some of the prominent players operating in the global high-k and CVD ALD metal precursors market are:
Air Liquide
Air Products & Chemicals, Inc.
Praxair
Linde
Dow Chemical
Report Attribute |
Details |
Market size value in 2021 |
USD 498.0 million |
Revenue forecast in 2028 |
USD 761.1 million |
Growth Rate |
CAGR of 6.2% from 2021 to 2028 |
Base year for estimation |
2020 |
Historical data |
2018 - 2019 |
Forecast period |
2021 - 2028 |
Quantitative units |
Revenue in USD million and CAGR from 2021 to 2028 |
Report coverage |
Revenue forecast, company ranking, competitive landscape, growth factors, and trends |
Segments covered |
Technology, region |
Regional scope |
North America; Europe; Asia Pacific; Latin America; Middle East & Africa |
Country Scope |
U.S.; Canada; U.K.; Germany; China; India; Japan; Brazil; Mexico |
Key companies profiled |
Air Liquide; Air Products & Chemicals, Inc.; Praxair; Linde; Dow Chemical |
Customization scope |
Free report customization (equivalent up to 8 analysts working days) with purchase. Addition or alteration to country, regional, and segment scope. |
Pricing and purchase options |
Avail customized purchase options to meet your exact research needs. Explore purchase options |
This report forecasts revenue growth at global, regional, and country levels and provides an analysis of the latest industry trends in each of the sub-segments from 2018 to 2028. For this study, Grand View Research has segmented the global high-k and CVD ALD metal precursors market report based on technology and region:
Technology Outlook (Revenue, USD Million, 2018 - 2028)
Interconnect
Capacitors
Gates
Regional Outlook (Revenue, USD Million, 2018 - 2028)
North America
U.S.
Canada
Europe
U.K.
Germany
Asia Pacific
China
India
Japan
Latin America
Brazil
Mexico
Middle East & Africa
b. The global high-k & CVD ALD metal precursors market size was estimated at USD 482.1 million in 2020 and is expected to reach USD 498.0 million in 2021.
b. The global high-k & CVD ALD metal precursors market is expected to grow at a compound annual growth rate of 6.2% from 2021 to 2028 to reach USD 761.1 million by 2028.
b. The Asia Pacific dominated the high-k & CVD ALD metal precursors market with a share of 63.8% in 2019. This is attributable to the demand for electronic products in China and the continued outsourcing of electronic equipment production to China.
b. Some key players operating in the high-k & CVD ALD metal precursors market include Air Liquide; Air Products &Chemicals, Inc.; Praxair; Merck KGaA; and Dow Chemical Company amongst others.
b. Key factors that are driving the high-k & CVD ALD metal precursors market growth include the rising need for rapidly accessing and storing data and the demand for metal precursors, such as aluminum, hafnium, cobalt, titanium, tantalum, tungsten, and zirconium, with higher dielectric constants.
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The exponential spread of COVID-19 worldwide has had an adverse impact on the semiconductor industry with manufacturing facilities temporarily shut, leading to a significant slowdown in the production. The outbreak could result in disruption across the ecosystem with several supply chain participants shifting their production facilities outside China, thereby reducing their over-reliance on China. Lockdowns imposed by the governments in the wake of the Covid-19 outbreak has not only affected manufacturing but also hauled consumer demand for semiconductor devices. Our analysts predict a decline in semiconductor revenue by over 1% in 2020 as compared to that in 2019. The report will account for Covid19 as a key market contributor.
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